DUBLIN, Dec. 30, 2014 /PRNewswire/ --Research and Markets
(http://www.researchandmarkets.com/research/3kh3rg/photoresists_and) has announced the addition of the "Photoresists and Photoresist Ancillaries Market for Semiconductors & Integrated Circuits, Printed Circuit Boards and Other Applications - Global Industry Analysis, Size, Share, Growth, Trends and Forecast, 2014 - 2020" report to their offering.
'Photoresists (g-line and i-line, KrF, ArF Dry, ArF Immersion) and Photoresist Ancillaries (Anti-reflective Coatings, Photoresist Developers, Edge Bead Removers and Others) Market for Semiconductors & Integrated Circuits, Printed Circuit Boards and Other Applications - Global Industry Analysis, Size, Share, Growth, Trends and Forecast, 2014 - 2020'
Photoresists are light-sensitive materials that are primarily used in fabrication and packaging of semiconductors, integrated circuits, flat panel displays and printed circuit boards. Photoresists play an important role in photolithography and photo-patterning process. Photoresists consist of resin or polymer, solvent and photo-sensitizer. These are segmented into positive and negative photoresists based on developing option. Photoresists are applied on the surface of a wafer and further exposed to light of pre-determined wavelength. Photoresist ancillaries are supporting materials that are used to improve the efficiency and resolution of the photolithography process. These are used right from the start of the process such as adhesion promotion of photoresists to wafer substrate in order to develop photoresists to remove excessive photoresists after the developer treatment.
Growth in semiconductor industry and dynamic flat panel display technology trends are expected to be the major driving factors for growth of the photoresists and photoresist ancillaries market. However, environmental and occupational health hazards associated with photoresists and photoresist ancillaries component is expected to hamper market growth. The upcoming nanoelectromechanical systems (NEMS) are anticipated to provide opportunities for players in the market.
This report provides detailed analysis and forecast of the photoresists and photoresist ancillaries market on a global and regional level from 2014 to 2020. On the global level, the market has been segmented based on revenue (US$ Mn) from 2014 to 2020. In order to provide in-depth understanding of the market at the regional level, demand has been forecast in terms of revenue (US$ Mn) from 2014 to 2020. The report includes drivers and restraints, and their impact on the growth of the market during the forecast period. The study also encompasses opportunities for market growth at the global level.
The report includes a thorough analysis of the value chain in order to provide detailed understanding of the market. It comprises of a Porter's Five Forces model, which provides an insight into the intensity of competition in the market. Furthermore, the study includes market attractiveness analysis, where various end-users are benchmarked based on market size, growth rate and general attractiveness.
Key Topics Covered:
Chapter 1 Preface
Chapter 2 Executive Summary
Chapter 3 Photoresists and Photoresist Ancillaries Market - Industry Analysis
Chapter 4 Photoresists Market - Product Segment Analysis
Chapter 5 Global Photoresist Ancillaries Market - Product Segment Analysis
Chapter 6 Global Photoresists and Photoresist Ancillaries Market - Application Analysis
Chapter 7 Global Photoresists and Photoresist Ancillaries Market - Regional Analysis
Chapter 8 Company profiles
- Avantor Performance Materials Inc.
- E. I. du Pont de Nemours and Company
- FUJIFILM Electronics Materials Co. Ltd.
- JSR Corporation
- LG Chem Ltd
- Merck KGaA
- Shin-Etsu Chemical Co. Ltd.
- Sumitomo Chemical Co. Ltd.
- TOKYO OHKA KOGYO CO. LTD.
- The Dow Chemical Company
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SOURCE Research and Markets