EUV Mask Blanks Market Size to Reach USD 1.36 Billion by 2031, Driven by Advanced Semiconductor Lithography | Valuates Reports

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18 Dec, 2025, 15:01 GMT

What is the Market Size of EUV Mask Blanks?

BANGALORE, India, Dec. 18, 2025 /PRNewswire/ -- The global market for EUV Mask Blanks was valued at USD 591 Million in the year 2024 and is projected to reach a revised size of USD 1360 Million by 2031, growing at a CAGR of 12.2% during the forecast period.

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What are the key factors driving the growth of the EUV Mask Blanks Market?

The EUV Mask Blanks Market represents a highly specialized segment within the semiconductor manufacturing ecosystem, supporting advanced pattern transfer requirements for cutting edge chip fabrication. This market centers on ultra precise blank substrates that serve as the foundation for complex mask structures used in extreme ultraviolet processes. Demand is shaped by stringent defect control expectations, optical consistency needs, and compatibility with advanced lithography workflows. Suppliers focus on delivering stability, surface uniformity, and long lifecycle performance to meet evolving production expectations. Market activity reflects close collaboration between material producers, equipment vendors, and semiconductor manufacturers. As fabrication strategies emphasize reliability and yield protection, EUV mask blanks continue gaining strategic importance across the semiconductor value chain globally.

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TRENDS INFLUENCING THE GROWTH OF THE EUV MASK BLANKS MARKET:

Glass masks contribute to EUV Mask Blanks Market expansion by offering exceptional surface smoothness, dimensional stability, and optical consistency required for advanced patterning environments. Their material characteristics support precise multilayer deposition and minimize distortion during exposure and processing stages. Glass based substrates enable tighter defect management, which is critical for maintaining pattern fidelity across complex chip architectures. Manufacturers value glass masks for their ability to support rigorous inspection protocols and repeated handling without performance degradation. As fabs pursue higher reliability and reduced rework, glass masks align with operational priorities focused on yield assurance. This alignment strengthens procurement demand, encourages long term supplier relationships, and reinforces glass masks as a foundational element within EUV mask blank adoption strategies.

Quartz masks drive growth in the EUV Mask Blanks Market through their superior thermal resistance, structural uniformity, and compatibility with precision fabrication workflows. Quartz materials maintain stability under demanding process conditions, supporting consistent pattern transfer and minimizing variability across production cycles. Their inherent purity assists in controlling contamination risks, a critical consideration for advanced lithography environments. Quartz masks also integrate well with established cleaning, inspection, and repair processes, allowing fabs to maintain efficiency without workflow disruption. As semiconductor manufacturers prioritize repeatability and long term asset utilization, quartz based solutions remain attractive. This sustained preference reinforces market momentum, encouraging continued investment in quartz mask blank development and supply capacity.

Semiconductor manufacturing demand strongly accelerates EUV Mask Blanks Market growth as chipmakers pursue greater pattern precision, scalability, and process control. Advanced device architectures require mask blanks that can support intricate designs while maintaining optical integrity throughout repeated exposures. Semiconductor fabs emphasize materials that reduce defect propagation, improve consistency, and align with stringent qualification standards. EUV mask blanks respond directly to these needs by enabling reliable lithography performance across complex production environments. As semiconductor applications expand across computing, connectivity, and automation ecosystems, manufacturers increasingly rely on advanced lithography solutions. This reliance sustains steady demand for high quality mask blanks, positioning the market as an essential enabler within the broader semiconductor supply chain.

Supply chain reliability plays a central role in driving the EUV Mask Blanks Market, as manufacturers seek stable access to critical materials supporting advanced lithography operations. Semiconductor fabs require consistent quality, predictable delivery, and close supplier coordination to avoid production disruptions. EUV mask blanks involve specialized materials and processes, making dependable sourcing a strategic priority. Suppliers that demonstrate strong logistics capabilities, quality assurance systems, and responsive technical support gain preference among buyers. This emphasis encourages long term agreements and capacity planning initiatives. As fabs expand advanced process adoption, the need for resilient supply chains strengthens, directly contributing to sustained market demand and encouraging further investment in localized and diversified manufacturing networks.

Stringent quality control requirements significantly influence EUV Mask Blanks Market growth by elevating demand for materials capable of meeting exacting performance thresholds. Advanced lithography workflows tolerate minimal defects, pushing fabs to select mask blanks with proven inspection compatibility and consistent surface characteristics. Quality assurance protocols extend across production, handling, and storage, increasing reliance on suppliers with robust testing and certification capabilities. As yield protection becomes a central operational focus, manufacturers prioritize mask blanks that reduce rework risk and ensure predictable outcomes. This dynamic drives continuous improvement initiatives among suppliers and strengthens buyer commitment to premium solutions, reinforcing market expansion through sustained emphasis on quality excellence.

Yield optimization focus drives the EUV Mask Blanks Market by aligning material selection with performance outcomes across semiconductor production lines. Mask blanks directly influence defect rates, exposure accuracy, and downstream process stability, making them critical to yield management strategies. Semiconductor manufacturers invest in materials that help minimize variability and protect high value wafers from costly losses. EUV mask blanks designed for consistency and durability support these objectives by reducing error propagation during lithography stages. As fabs compete on efficiency and reliability, yield optimization becomes a strategic differentiator. This focus elevates the role of advanced mask blanks, increasing adoption rates and reinforcing market growth driven by operational performance priorities.

Cost management pressures influence EUV Mask Blanks Market growth by shaping procurement strategies toward materials that balance performance with lifecycle value. While advanced lithography demands premium quality, manufacturers also seek solutions that reduce total ownership costs through durability and reduced replacement frequency. EUV mask blanks that maintain stability across repeated usage cycles help control operational expenses. This balance supports budgeting predictability and long term planning for fabs operating at scale. As cost efficiency remains a core management objective, demand grows for mask blanks that deliver consistent performance without excessive maintenance burdens, reinforcing market growth through value oriented decision making.

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What are the product types in the EUV Mask Blanks Market?

Type 1
Type 2

What are the main applications of the EUV Mask Blanks Market?

Semiconductor
IC (integrated circuit)
Others

Key Players in the EUV Mask Blanks Market

Hoya is a leading supplier of EUV mask blanks and ultra-flat glass substrates used in advanced semiconductor lithography.
AGC Inc manufactures high-quality EUV mask blanks and specialty glass materials supporting next-generation semiconductor fabrication.
S&S Tech supplies EUV mask blanks and related precision materials for advanced lithography and semiconductor manufacturing.
Applied Materials provides deposition and materials engineering technologies essential for producing EUV mask blanks with atomic-scale precision.
Photronics Inc is a major photomask manufacturer that utilizes EUV mask blanks for advanced logic and memory semiconductor production.

EUV Mask Blanks Market Share Analysis

The global key manufacturers of EUV Mask Blanks include AGC Inc and Hoya, etc, top 2 manufacturers hold a share of approximately 93%.

AGC Inc is the world's largest EUV Mask Blanks manufacturer, with a market share of more than 59%.

APAC is the largest market with a share of 73%.

In terms of applications, Semiconductor is the largest downstream segment, with a market share of about 90%.

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What are some related markets to the EUV Mask Blanks Market?

The global market for Quartz Chromium Mask was valued at USD 5952 Million in the year 2024 and is projected to reach a revised size of USD 8257 Million by 2031, growing at a CAGR of 4.6% during the forecast period.
Photomask Repair System Market
Semiconductor Multi-Beam Mask Writer Market
The global market for Multi-beam Mask Writer was valued at USD 960 Million in the year 2024 and is projected to reach a revised size of USD 2084 Million by 2031, growing at a CAGR of 11.9% during the forecast period.
The global market for EUV Pellicle was valued at USD 78.8 Million in the year 2024 and is projected to reach a revised size of USD 171 Million by 2031, growing at a CAGR of 8.6% during the forecast period.
The global market for Photomask Blanks for Integrated Circuits was valued at USD 1557 Million in the year 2024 and is projected to reach a revised size of USD 2230 Million by 2031, growing at a CAGR of 5.4% during the forecast period.
EUV Lithography Market
The global market for DUV Lithography Systems was valued at USD 15440 Million in the year 2024 and is projected to reach a revised size of USD 23690 Million by 2031, growing at a CAGR of 6.4% during the forecast period.
The global market for Quartz Glass Mask Blanks was valued at USD 2750 Million in the year 2024 and is projected to reach a revised size of USD 4135 Million by 2031, growing at a CAGR of 6.0% during the forecast period.
The global market for Lithography Lens was valued at USD 1126 Million in the year 2024 and is projected to reach a revised size of USD 1727 Million by 2031, growing at a CAGR of 6.4% during the forecast period.
The global market for EUV Mask Defect Detection Equipment was estimated to be worth USD 27 Million in 2023 and is forecast to a readjusted size of USD 37 Million by 2030 with a CAGR of 3.8% during the forecast period 2024-2030.
The global market for EUV Photoresists was valued at USD 296 Million in the year 2024 and is projected to reach a revised size of USD 1409 Million by 2031, growing at a CAGR of 25.4% during the forecast period.
The global Mask Blank market was valued at USD 1764.2 Million in 2022 and is anticipated to reach USD 2220.4 Million by 2029, witnessing a CAGR of 3.3% during the forecast period 2023-2029.

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